TMR Device with World Best Performance Fabricated by Mass Manufacturing System

Release of metal-CVD equipment for experiments and small-size production of MEMS

High-density "Nanocrystalline Si" thin film was realized by nano technology for control of chemical vapor deposition.

Canon ANELVA Corporation amalgamated with Canon ANELVA Engineering Corporation and Canon ANELVA Technix Corporation.

Information of company name change.

Acquisition of our entire shares by Canon.

NTSL became an Anelva Corporation Group Company.

Vacuum component businesses were separated.

In 2003, "Research on the technology of manufacturing sub nano-level flat large glass substrate" was chosen as one of the winners of unique innovative technical research and development proposals submitted in response to the invitation for public participation by the Ministry of Education, Culture, Sports, Science and Technology.

"Third Japan Vacuum Industry Association President's Award" was received.