Requirements for the quality and process of thin films are becoming more demanding due to the increase in variety of display devices.
The C-3500/3530 series is multi-chamber cluster-type PVD equipment that has incorporated our original cathode concept in order to satisfy those requirements for a variety of processes.
This series responds to the various needs for OLED electrode films, ultra-thin film process, etc. in addition to TFT wiring films.

Typical multi-chamber cluster-type PVD equipment can deposit only one kind of material per film deposition chamber, and accordingly requires as many deposition chambers as the materials needed. The C-3580 series has been developed in pursuit of compactness as well as the multifunctionality that allows as many as three materials to be deposited in a single film deposition chamber.
In this series, as in the C-3530, the cathode concept adopts a configuration created by making full use of our original technologies. To meet applications and scale of production, the C-3580 series is available in two types: The single type C-3580S with one film deposition chamber and the Dual type C-3580D with two film deposition chambers.

Recently, the size of mother glass has been increasing in shorter cycles as the market for large-size LCD-TVs is more expanding. Making the expansion of TV screen sizes compatible with productivity of investment is becoming increasingly important, and this situation is demanding the re-creation of equipment concepts.
We have combined the features of conventional in-line type equipment with those of the cluster type in developing the PVD equipment C-3711, thus embodying a new equipment concept.
While the feature of simultaneously forming two films realizes high throughput, adoption of the vertical substrate transfer and our original “rectangular split cathode” allow three different types in maximum of material to be deposited in the same chamber in layers, resulting in remarkable space saving.

This horizontal inline PVD system is designed for deposition of electrodes and precursor films of photovoltaic cells. C-3950 series achieves shorter tact time, has innovative cathodes with higher target efficiency rate, and enables simple configuration. C-3950 series specification can be chosen from either with tray or without tray system to meet various processes.

This series realizes the reduction of particles and automated operation required in forming ITO transparent conductive films, metal electrode wiring films, and dielectric films in the manufacturing process of liquid crystal display devices.
This vertical in-line PVD equipment simultaneously transfers two trays for glass substrates while forming films on both sides so that a large number of large-scale substrates can be processed.