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CANON ANELVA CORPORATION

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  • Semiconductor Device Manufacturing Equipment

Products

  • Semiconductor Device Manufacturing Equipment
    • FC7100  Metal Gate Process PVD Equipment
    • IC7500  Memory Wire PVD Mass Production Equipment(φ300mm support)
    • IC7400  PVD Equipment for Wafer Packaging (φ300mm support)
    • FC7000(φ200mm)/
      FC7200(φ300mm)
      Surface Reaction Epitaxy Equipment
    • EC7800  PVD Equipment for Semiconductor (φ300mm support)
    • EC8000  Dry Etching Equipment
  • Storage Device Manufacturing Equipment
  • Equipment for Electronic Device Manufacturing and for R&D
  • Panel Device Manufacturing Equipment
  • Vacuum Components

Semiconductor Device Manufacturing Equipment

Semiconductors are used in extremely broad range of products today and have become indispensable to an information-oriented society.
CANON ANELVA develops and manufactures highly reliable sputtering equipment for use in semiconductor production lines.
Thin film formation by sputtering plays a very important role in nanometer level processing required for a large scale integration of semiconductor devices.

Metal Gate Process PVD Equipment

FC7100  Metal Gate Process PVD Equipment

Memory Wire PVD Mass Production Equipment

IC7500  Memory Wire PVD Mass Production Equipment (φ300mm support)

PVD Equipment for Wafer Packaging

IC7400  PVD Equipment for Wafer Packaging (φ300mm support)

Surface Reaction Epitaxy Equipment

FC7000(φ200mm)/FC7200(φ300mm) Surface Reaction Epitaxy Equipment

PVD Equipment for Semiconductor

EC7800  PVD Equipment for Semiconductor (φ300mm support)

Dry Etching Equipment

EC8000 Dry Etching Equipment

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