Inline Type PVD Equipment for Electronic Component Production  EL3200

Equipment for Electronic Device Manufacturing and for R&D

EL3200 is a horizontal inline type PBC equipment capable of single layer deposition and multi-layer deposition (up to 3 layers) by transporting a square tray one by one to the deposition area.

EL3200  Inline Type PVD Equipment for Electronic Component Production

Applications

Electronic component production

Features

  • Selectable between single side sputtering (depo UP or depo DOWN) and both side sputtering according to production volume
  • Supports laminated films by using up to 3 (single side) cathodes
  • Can accommodate up to 25 trays in the stocker chamber
  • Pre-heating chamber (preprocessing) can be expanded (Option)

Specifications

System configuration:
Horizontal inline type
Substrate size:
Effective deposition area 300mm×450mm
Cathode:
5"×16" cathode×3 (single side)


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