Metal Gate Process PVD Equipment FC7100

FC7100  Metal Gate Process PVD Equipment

A φ300mm support cluster type PVD equipment for damage-less metal gate production using our original sputtering technology.

FC7100  Metal Gate Process PVD Equipment

Applications

Metal gate mass production

Features

  • Capable of controlled film composition through ultrahigh vacuum co-sputtering.
  • High-precision control of (0.1nm unit) film thickness and excellent uniformity (1σ < 1%).
  • Compatible with the sub-32nm node or less damascene gate formation process.
    (High-coverage deposition with the PCM-PVD method).
  • Low material cost through use of compact cathode. Easy material changeover.

Specifications

System configuration:
Cluster type
Substrate size:
φ300mm


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