Dry Etching Equipment EC8000

EC8000  Dry Etching Equipment

Mass production equipment capable of integrated processing of MRAM magnetic multilayer film mask/MTJ (dry etching) and protective film formation (CVD).

EC8000  Dry Etching Equipment

Applications

R&D of MRAM

Features

  • Offering high yield with real devices
  • Enables micropattern processing free of shorts at the mass-production level.
  • Capable of retaining a high MR ratio even after etching.
  • Capable of integrated formation of protective films after processing (CVD chamber expansion).
  • Low-damage process with CH3OH gas.
  • Easy maintenance and flexible equipment configuration

Specifications

System configuration:
Cluster type
Substrate size:
φ300mm


© CANON ANELVA CORPORATION

Contact us  |  Terms of use  |  Privacy notice