MRAM PVD Equipment NC7900

NC7900  MRAM PVD Equipment (φ300mm support)

NC7900 is PVD equipment to form multi-stacked MTJ layers which is core element of next generation Non-Volatic memory.

NC7900 is also compatible with formation of perpendicular stacked MTJ for STT-MRAM.

NC7900  MRAM PVD Equipment

Applications

MRAM volum manufactureing

Features

  • Ultra high vacuum and oblique angle rotation PVD
  • Fine interface control with ultra thin multi layers
  • Compatible with Planar & Perpendicular MTJ formation
  • Throughput of 25 wafers/h with perpendicular MTJ process is achieved

Specifications

System configuration:
Cluster type
Substrate size:
φ300mm


© CANON ANELVA CORPORATION

Contact us  |  Terms of use  |  Privacy notice